13. A. Dodabalapur, J.P. Kesan, D.P.Neikirk, and B.G. Streetman, “Photoluminescence Studies of Modulation-Doped Pseudomorphic InGaAs/AlGaAs/GaAs Quantum Wells,” Appl. Phys. Lett., vol. 54, no. 17, pp. 1675-1677, 24 Apr. 1989.
14. A.C. Campbell, J.P. Kesan, T.R. Block, G.E. Crook, D.P. Neikirk, and B.G. Streetman, “Influence of MBE Growth Temperature on GaAs/AlAs Resonant Tunneling Structures,” J. Elect. Mat., vol. 18, no. 5, pp. 585-588, 1989.
15. J.P. Kesan, A.Mortazawi, D.R. Miller, V.K. Reddy, D.P. Neikirk, and T. Itoh, “Microwave and Millimeter-Wave QWITT Diode Oscillator,” IEEE Trans. Microwave Theory & Tech., vol. 37, no. 12, pp. 1933-1941, Dec. 1989.
16. F.K. LeGoues, J.P. Kesan, and S.S. Iyer, “Long-Range Order in Thick, Unstrained Si0.5Ge0.5 Epitaxial Layers,” Phys. Rev. Lett., vol. 64, no. 1, pp. 40-43, 1 Jan. 1990.
17. A. Dodabalapur, J.P. Kesan, D.P. Neikirk, B.G. Streetman, M.H. Herman, and I.D. Ward, “Photoluminescence and Electroreflectance Studies of Modulation-Doped Pseudomorphic AlGaAs/InGaAs/GaAs Quantum Wells,” J. Elect. Mat., vol. 19, no. 3, pp. 265-270, 1990.
18. U. Gennser, J.P. Kesan, S.S. Iyer, T.J. Bucelot, and E.S. Yang, “Resonant Tunneling of Holes through Silicon Barriers,” J. Vac. Sci. & Technol. B, vol. 8, no. 2, pp. 210-213, Mar./Apr., 1990.
19. F.K. LeGoues, J.P. Kesan, S.S. Iyer, J. Tersoff, and R. Tromp, “Surface Stress Induced Order in SiGe Alloy Films,” Phys. Rev. Lett., vol. 64, no. 17, pp. 2038-2041, 23 Apr. 1990.
20. J.P. Kesan, S.S. Iyer, and J.M. Cotte, “Dopant Incorporation in Epitaxial Germanium Grown on Ge(100) Substrates by MBE,” J. Cryst. Growth, vol. 111, pp. 847-855, 1991.
21. J.P. Kesan, P.G. May, F.K. LeGoues, and S.S. Iyer, “Si/SiGe Heterostructures Grown on SOI Substrates by MBE for Integrated Optoelectronics,” J. Crystal Growth, vol. 111, pp. 936-942, 1991.
22. U. Gennser, J.P. Kesan, S.S. Iyer, T.J. Bucelot, and E.S. Yang, “Temperature Dependent Transport Measurements on Strained Si/Si1-xGex Resonant Tunneling Devices,” J. Vac. Sci. & Technol. B, vol. 9, no. 4, pp. 2059-2063, Jul./Aug. 1991.
23. J.P. Kesan, S.S. Iyer, and J.M. Cotte, “P-Type Doping of Germanium Grown by Molecular Beam Epitaxy on Ge(100) Substrates,” Appl. Phys. Lett., vol. 59, no. 7, pp. 852-854, 12 Aug. 1991.
24. S.S. Iyer, P.M. Solomon, J.P. Kesan, A.A. Bright, J.L. Freeouf, T.N. Nguyen, and A.C. Warren, “A Gate-Quality Dielectric System for SiGe Metal-Oxide-Semiconductor Devices, IEEE Electron Device Lett., vol. 12, no. 5, pp. 246-248, May 1991.
25. J. Eugene, F.K. LeGoues, J.P. Kesan, S.S. Iyer, and F.M. d’Heurle, “Diffusion versus Oxidation Rates in Silicon-Germanium Alloys,” Appl. Phys. Lett., vol. 59, no. 1, pp. 78-80, 1 Jul. 1991.